Product Information
Wafer with film
High-quality and high-value-added products are offered.
Membrane type classification | Membrane type | Film formation method |
---|---|---|
Oxide | Th-SiO2 | Thermal |
Low-Particle Th-SiO2 * | Thermal | |
PE-SiO2 | PE-CVD | |
PE-TEOS | PE-CVD | |
LP-CVD TEOS | PE-CVD | |
HDP | PE-CVD | |
USG | PE-CVD | |
PSG | CVD | |
BPSG | CVD | |
RTO | Anneal | |
Doped on Doped Poly | LP-CVD | |
Amorphous | PE-CVD | |
Nitride | LP-CVD SIN | LP-CVD |
PE-CVD SIN | PE-CVD | |
Picture Resists |
I-Line | Coating |
KrF | Coating | |
ArF | Coating | |
Low-K | BD | CVD |
BDⅡX | CVD | |
AURORA | CVD | |
CORAL | CVD | |
Metal | Ta, TaN | Spatter |
Ti, TiN | Spatter | |
W | Spatter CVD |
|
Cr | Spatter | |
Cu | Spatter, EP | |
Al, Al - Cu, Al - Si | Spatter | |
Pt | Spatter | |
Ni | Spatter | |
Ru | Spatter | |
Pd | Spatter | |
Au | Spatter | |
Co | Spatter | |
etc. | Spatter |
*Other membrane types are also available in addition to the aforementioned types of membranes. Specification of the desired film thickness is necessary.
Low Particle Thermal Oxide Wafer
Shiseu 髯 · 辭 辭 辭 冶 冶 え え え え シ シ シ シ シ シ シ シ シ
Low Particle Thermal Oxide Wafer formed in a state-of-the-art oxidizing furnace that controls particles and metal contamination is proposed.
Atomic Layer Deposition
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Next Generation Gate Material
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ALD High-K gate insulating film
Logic ... HfSiO, ZrSiO, etc
Memory ... HfO, ZrO, AlO, HfSiO, TiO, etc -
ALD metal electrode
Logic ... Ti, TiN, Ta, TaN, TiSiN, TaSiN, TaSiN, HfN, HfSiN, etc
Memory ... Ti, TiN, Ta, TaN, TiSiN, TaSiN, etc
*Film types in addition to the aforementioned types are also available.
Ion Implantation Wafer
Pediatric surgery and treatment
- Ion species: B +, BF2 +, P +, As +, In +, etc.
- Dose: 1011 ~ 1015 ions / cm2
- Acceleration energy: 5Kev ~ 4.6Mev
- RTA processing